摘要：采用直流反应磁控溅射在A1Mn合金表面制备出ITO薄膜。采用扫描电镜、x射线衍射、紫外一可见光测试、磨损试验、盐雾试验、薄膜厚度测量和显微硬度试验等方法对制备的 IT0薄膜表面进行检测分析。结果表明：在溅射功率210 W、衬底温度l20。C、溅射时间20 min的条件下，AlMn合金表面的IT0薄膜晶粒尺寸细小，与基底结合良好，AlMn合金表面光泽度好，强度、硬度高，并具有一定的耐磨、耐蚀性能。
关键词：铝锰合金；氧化铟锡；薄膜；直流反应磁控溅射
中图分类号：TGl74．444；TU50 文献标志码：A
文章编号：1004-227X(2009)09-0035-04
Preparation of IT0 thin film on the surface of AlMn ahoy by direct-current reactive magnetron sputtering／／HUANG Xiao．hui，ZUO Xiu．rong*，JI Zhong-hua
Abstract：IT0 thin films were deposited on AlMn alloy by direct current magnetron spuRering．The surface morphology and structure of the ITO thin films were analyzed by scanning electron microscopy，X-ray diffraction，UV-Vis spectroscopy，wear test，film thickness measurement， microhardness test and salt spray test．The experimental results showed that the ITO thin films have the features of fine grain size，good adhesion，good luster，high intensity and hardness，moderate corrosion resistance and abrasive resistance under the conditions of sputtering power 210 W．substrate temperature l20℃ and sputtering time 20 min．
Keywords：aluminum-manganese alloy；iridium tin oxide； thin film；direct．current reactive magnetron spuRering
First-author"S address：Key Laboratory of Material Physics，Zhengzhou University，Zhenzhou 450052，China
